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dc.contributor.authorBunshah, Rointan F.-
dc.contributor.authorJou, Shyankay-
dc.contributor.authorPrakash, Shiva-
dc.contributor.authorDoerr, Hans J.-
dc.contributor.authorIsaacs, Lyle-
dc.contributor.authorWehrsig, Arno-
dc.contributor.authorYeretzian, Chahan-
dc.contributor.authorCynn, Hyunchae-
dc.contributor.authorDiederich, Francois-
dc.date.accessioned2018-04-23T08:33:46Z-
dc.date.available2018-04-23T08:33:46Z-
dc.date.issued1992-
dc.identifier.issn0022-3654de_CH
dc.identifier.issn1541-5740de_CH
dc.identifier.urihttps://digitalcollection.zhaw.ch/handle/11475/5445-
dc.description.abstractThe authors report the formation of fullerenes from graphite by sputtering and electron beam evaporation. Under conditions that differ dramatically from those in the previously known fullerene production processes, the new methods preferentially yield the soluble higher fullerenes C70, C76, C78, and C84 in addition to minor amounts of C60 only. Upon passage of carbon particles formed by electron beam evaporation through an electrostatic field, fullerenes are mainly isolated from the cathode, not from the anode, which supports the formation of cationic intermediates in fullerene growth mechanisms. The variables thought to be important for fullerene production can be controlled efficiently in the new processes.de_CH
dc.language.isoende_CH
dc.publisherAmerican Chemical Societyde_CH
dc.relation.ispartofThe Journal of Physical Chemistryde_CH
dc.rightsLicence according to publishing contractde_CH
dc.subjectFullerenesde_CH
dc.subject.ddc540: Chemiede_CH
dc.titleFullerene formation in sputtering and electron beam evaporation processesde_CH
dc.typeBeitrag in wissenschaftlicher Zeitschriftde_CH
dcterms.typeTextde_CH
zhaw.departementLife Sciences und Facility Managementde_CH
zhaw.organisationalunitInstitut für Chemie und Biotechnologie (ICBT)de_CH
zhaw.publisher.placeWashingtonde_CH
dc.identifier.doi10.1021/j100196a005de_CH
zhaw.funding.euNode_CH
zhaw.issue17de_CH
zhaw.originated.zhawYesde_CH
zhaw.pages.end6869de_CH
zhaw.pages.start6866de_CH
zhaw.publication.statuspublishedVersionde_CH
zhaw.volume96de_CH
zhaw.publication.reviewPeer review (Publikation)de_CH
Appears in collections:Publikationen Life Sciences und Facility Management

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Bunshah, R. F., Jou, S., Prakash, S., Doerr, H. J., Isaacs, L., Wehrsig, A., Yeretzian, C., Cynn, H., & Diederich, F. (1992). Fullerene formation in sputtering and electron beam evaporation processes. The Journal of Physical Chemistry, 96(17), 6866–6869. https://doi.org/10.1021/j100196a005
Bunshah, R.F. et al. (1992) ‘Fullerene formation in sputtering and electron beam evaporation processes’, The Journal of Physical Chemistry, 96(17), pp. 6866–6869. Available at: https://doi.org/10.1021/j100196a005.
R. F. Bunshah et al., “Fullerene formation in sputtering and electron beam evaporation processes,” The Journal of Physical Chemistry, vol. 96, no. 17, pp. 6866–6869, 1992, doi: 10.1021/j100196a005.
BUNSHAH, Rointan F., Shyankay JOU, Shiva PRAKASH, Hans J. DOERR, Lyle ISAACS, Arno WEHRSIG, Chahan YERETZIAN, Hyunchae CYNN und Francois DIEDERICH, 1992. Fullerene formation in sputtering and electron beam evaporation processes. The Journal of Physical Chemistry. 1992. Bd. 96, Nr. 17, S. 6866–6869. DOI 10.1021/j100196a005
Bunshah, Rointan F., Shyankay Jou, Shiva Prakash, Hans J. Doerr, Lyle Isaacs, Arno Wehrsig, Chahan Yeretzian, Hyunchae Cynn, and Francois Diederich. 1992. “Fullerene Formation in Sputtering and Electron Beam Evaporation Processes.” The Journal of Physical Chemistry 96 (17): 6866–69. https://doi.org/10.1021/j100196a005.
Bunshah, Rointan F., et al. “Fullerene Formation in Sputtering and Electron Beam Evaporation Processes.” The Journal of Physical Chemistry, vol. 96, no. 17, 1992, pp. 6866–69, https://doi.org/10.1021/j100196a005.


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