| Publikationstyp: | Beitrag in wissenschaftlicher Zeitschrift |
| Art der Begutachtung: | Peer review (Publikation) |
| Titel: | Fullerene formation in sputtering and electron beam evaporation processes |
| Autor/-in: | Bunshah, Rointan F. Jou, Shyankay Prakash, Shiva Doerr, Hans J. Isaacs, Lyle Wehrsig, Arno Yeretzian, Chahan Cynn, Hyunchae Diederich, Francois |
| DOI: | 10.1021/j100196a005 |
| Erschienen in: | The Journal of Physical Chemistry |
| Band(Heft): | 96 |
| Heft: | 17 |
| Seite(n): | 6866 |
| Seiten bis: | 6869 |
| Erscheinungsdatum: | 1992 |
| Verlag / Hrsg. Institution: | American Chemical Society |
| Verlag / Hrsg. Institution: | Washington |
| ISSN: | 0022-3654 1541-5740 |
| Sprache: | Englisch |
| Schlagwörter: | Fullerenes |
| Fachgebiet (DDC): | 540: Chemie |
| Zusammenfassung: | The authors report the formation of fullerenes from graphite by sputtering and electron beam evaporation. Under conditions that differ dramatically from those in the previously known fullerene production processes, the new methods preferentially yield the soluble higher fullerenes C70, C76, C78, and C84 in addition to minor amounts of C60 only. Upon passage of carbon particles formed by electron beam evaporation through an electrostatic field, fullerenes are mainly isolated from the cathode, not from the anode, which supports the formation of cationic intermediates in fullerene growth mechanisms. The variables thought to be important for fullerene production can be controlled efficiently in the new processes. |
| URI: | https://digitalcollection.zhaw.ch/handle/11475/5445 |
| Volltext Version: | Publizierte Version |
| Lizenz (gemäss Verlagsvertrag): | Lizenz gemäss Verlagsvertrag |
| Departement: | Life Sciences und Facility Management |
| Organisationseinheit: | Institut für Chemie und Biotechnologie (ICBT) |
| Enthalten in den Sammlungen: | Publikationen Life Sciences und Facility Management |
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Bunshah, R. F., Jou, S., Prakash, S., Doerr, H. J., Isaacs, L., Wehrsig, A., Yeretzian, C., Cynn, H., & Diederich, F. (1992). Fullerene formation in sputtering and electron beam evaporation processes. The Journal of Physical Chemistry, 96(17), 6866–6869. https://doi.org/10.1021/j100196a005
Bunshah, R.F. et al. (1992) ‘Fullerene formation in sputtering and electron beam evaporation processes’, The Journal of Physical Chemistry, 96(17), pp. 6866–6869. Available at: https://doi.org/10.1021/j100196a005.
R. F. Bunshah et al., “Fullerene formation in sputtering and electron beam evaporation processes,” The Journal of Physical Chemistry, vol. 96, no. 17, pp. 6866–6869, 1992, doi: 10.1021/j100196a005.
BUNSHAH, Rointan F., Shyankay JOU, Shiva PRAKASH, Hans J. DOERR, Lyle ISAACS, Arno WEHRSIG, Chahan YERETZIAN, Hyunchae CYNN und Francois DIEDERICH, 1992. Fullerene formation in sputtering and electron beam evaporation processes. The Journal of Physical Chemistry. 1992. Bd. 96, Nr. 17, S. 6866–6869. DOI 10.1021/j100196a005
Bunshah, Rointan F., Shyankay Jou, Shiva Prakash, Hans J. Doerr, Lyle Isaacs, Arno Wehrsig, Chahan Yeretzian, Hyunchae Cynn, and Francois Diederich. 1992. “Fullerene Formation in Sputtering and Electron Beam Evaporation Processes.” The Journal of Physical Chemistry 96 (17): 6866–69. https://doi.org/10.1021/j100196a005.
Bunshah, Rointan F., et al. “Fullerene Formation in Sputtering and Electron Beam Evaporation Processes.” The Journal of Physical Chemistry, vol. 96, no. 17, 1992, pp. 6866–69, https://doi.org/10.1021/j100196a005.
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