Fullerene formation in sputtering and electron beam evaporation processes

Bunshah, Rointan F.; Jou, Shyankay; Prakash, Shiva; Doerr, Hans J.; Isaacs, Lyle; Wehrsig, Arno; Yeretzian, Chahan; Cynn, Hyunchae; Diederich, Francois

doi:10.1021/j100196a005

Publication type:	Article in scientific journal
Type of review:	Peer review (publication)
Title:	Fullerene formation in sputtering and electron beam evaporation processes
Authors:	Bunshah, Rointan F. Jou, Shyankay Prakash, Shiva Doerr, Hans J. Isaacs, Lyle Wehrsig, Arno Yeretzian, Chahan Cynn, Hyunchae Diederich, Francois
DOI:	10.1021/j100196a005
Published in:	The Journal of Physical Chemistry
Volume(Issue):	96
Issue:	17
Page(s):	6866
Pages to:	6869
Issue Date:	1992
Publisher / Ed. Institution:	American Chemical Society
Publisher / Ed. Institution:	Washington
ISSN:	0022-3654 1541-5740
Language:	English
Subjects:	Fullerenes
Subject (DDC):	540: Chemistry
Abstract:	The authors report the formation of fullerenes from graphite by sputtering and electron beam evaporation. Under conditions that differ dramatically from those in the previously known fullerene production processes, the new methods preferentially yield the soluble higher fullerenes C70, C76, C78, and C84 in addition to minor amounts of C60 only. Upon passage of carbon particles formed by electron beam evaporation through an electrostatic field, fullerenes are mainly isolated from the cathode, not from the anode, which supports the formation of cationic intermediates in fullerene growth mechanisms. The variables thought to be important for fullerene production can be controlled efficiently in the new processes.
URI:	https://digitalcollection.zhaw.ch/handle/11475/5445
Fulltext version:	Published version
License (according to publishing contract):	Licence according to publishing contract
Departement:	Life Sciences and Facility Management
Organisational Unit:	Institute of Chemistry and Biotechnology (ICBT)
Appears in collections:	Publikationen Life Sciences und Facility Management

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Bunshah, R. F., Jou, S., Prakash, S., Doerr, H. J., Isaacs, L., Wehrsig, A., Yeretzian, C., Cynn, H., & Diederich, F. (1992). Fullerene formation in sputtering and electron beam evaporation processes. The Journal of Physical Chemistry, 96(17), 6866–6869. https://doi.org/10.1021/j100196a005

Bunshah, R.F. et al. (1992) ‘Fullerene formation in sputtering and electron beam evaporation processes’, The Journal of Physical Chemistry, 96(17), pp. 6866–6869. Available at: https://doi.org/10.1021/j100196a005.

R. F. Bunshah et al., “Fullerene formation in sputtering and electron beam evaporation processes,” The Journal of Physical Chemistry, vol. 96, no. 17, pp. 6866–6869, 1992, doi: 10.1021/j100196a005.

BUNSHAH, Rointan F., Shyankay JOU, Shiva PRAKASH, Hans J. DOERR, Lyle ISAACS, Arno WEHRSIG, Chahan YERETZIAN, Hyunchae CYNN und Francois DIEDERICH, 1992. Fullerene formation in sputtering and electron beam evaporation processes. The Journal of Physical Chemistry. 1992. Bd. 96, Nr. 17, S. 6866–6869. DOI 10.1021/j100196a005

Bunshah, Rointan F., Shyankay Jou, Shiva Prakash, Hans J. Doerr, Lyle Isaacs, Arno Wehrsig, Chahan Yeretzian, Hyunchae Cynn, and Francois Diederich. 1992. “Fullerene Formation in Sputtering and Electron Beam Evaporation Processes.” The Journal of Physical Chemistry 96 (17): 6866–69. https://doi.org/10.1021/j100196a005.

Bunshah, Rointan F., et al. “Fullerene Formation in Sputtering and Electron Beam Evaporation Processes.” The Journal of Physical Chemistry, vol. 96, no. 17, 1992, pp. 6866–69, https://doi.org/10.1021/j100196a005.