|Title:||Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks|
|Authors :||Krishnamoorthy, Sivashankar|
|Published in :||Advanced Materials|
|Publisher / Ed. Institution :||Wiley|
|License (according to publishing contract) :||Licence according to publishing contract|
|Type of review:||Peer review (Publication)|
|Subjects :||Self-assembly; Surface structuring; Nanoparticles; Nanotechnology|
|Subject (DDC) :||620: Engineering|
|Abstract:||Nanopatterned self-assembled monolayers (SAMs) are obtained from a simple, straight-forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diams. of approx. 60 nm on a continuous hydrophopic background or vice versa. The surfaces are shown to be excellent tools for the prepn. of arrays of nanocrystals|
|Departement:||Life Sciences and Facility Management|
|Organisational Unit:||Institute of Chemistry and Biotechnology (ICBT)|
|Publication type:||Article in scientific Journal|
|Appears in Collections:||Publikationen Life Sciences und Facility Management|
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