Title: Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks
Authors : Krishnamoorthy, Sivashankar
Pugin, Raphael
Brugger, Juergen
Heinzelmann, Harry
Hinderling, Christian
Published in : Advanced materials
Volume(Issue) : 20
Issue : 10
Pages : 1962
Pages to: 1965
Publisher / Ed. Institution : Wiley
Issue Date: 2008
License (according to publishing contract) : Licence according to publishing contract
Type of review: Peer review (Publication)
Language : English
Subjects : Self-assembly; Surface structuring; Nanoparticles; Nanotechnology
Subject (DDC) : 620: Engineering
Abstract: Nanopatterned self-assembled monolayers (SAMs) are obtained from a simple, straight-forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diams. of approx. 60 nm on a continuous hydrophopic background or vice versa. The surfaces are shown to be excellent tools for the prepn. of arrays of nanocrystals
Departement: Life Sciences and Facility Management
Organisational Unit: Institute of Chemistry and Biotechnology (ICBT)
Publication type: Article in scientific Journal
DOI : 10.1002/adma.200702005
ISSN: 0935-9648
1521-4095
URI: https://digitalcollection.zhaw.ch/handle/11475/11957
Appears in Collections:Publikationen Life Sciences und Facility Management

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