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dc.contributor.authorKrishnamoorthy, Sivashankar-
dc.contributor.authorPugin, Raphael-
dc.contributor.authorBrugger, Juergen-
dc.contributor.authorHeinzelmann, Harry-
dc.contributor.authorHinderling, Christian-
dc.date.accessioned2018-10-18T13:45:22Z-
dc.date.available2018-10-18T13:45:22Z-
dc.date.issued2008-
dc.identifier.issn0935-9648de_CH
dc.identifier.issn1521-4095de_CH
dc.identifier.urihttps://digitalcollection.zhaw.ch/handle/11475/11957-
dc.description.abstractNanopatterned self-assembled monolayers (SAMs) are obtained from a simple, straight-forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diams. of approx. 60 nm on a continuous hydrophopic background or vice versa. The surfaces are shown to be excellent tools for the prepn. of arrays of nanocrystalsde_CH
dc.language.isoende_CH
dc.publisherWileyde_CH
dc.relation.ispartofAdvanced Materialsde_CH
dc.rightsLicence according to publishing contractde_CH
dc.subjectSelf-assemblyde_CH
dc.subjectSurface structuringde_CH
dc.subjectNanoparticlesde_CH
dc.subjectNanotechnologyde_CH
dc.subject.ddc620: Ingenieurwesende_CH
dc.titleNanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masksde_CH
dc.typeBeitrag in wissenschaftlicher Zeitschriftde_CH
dcterms.typeTextde_CH
zhaw.departementLife Sciences und Facility Managementde_CH
zhaw.organisationalunitInstitut für Chemie und Biotechnologie (ICBT)de_CH
dc.identifier.doi10.1002/adma.200702005de_CH
zhaw.funding.euNode_CH
zhaw.issue10de_CH
zhaw.originated.zhawYesde_CH
zhaw.pages.end1965de_CH
zhaw.pages.start1962de_CH
zhaw.publication.statuspublishedVersionde_CH
zhaw.volume20de_CH
zhaw.publication.reviewPeer review (Publikation)de_CH
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Krishnamoorthy, S., Pugin, R., Brugger, J., Heinzelmann, H., & Hinderling, C. (2008). Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks. Advanced Materials, 20(10), 1962–1965. https://doi.org/10.1002/adma.200702005
Krishnamoorthy, S. et al. (2008) ‘Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks’, Advanced Materials, 20(10), pp. 1962–1965. Available at: https://doi.org/10.1002/adma.200702005.
S. Krishnamoorthy, R. Pugin, J. Brugger, H. Heinzelmann, and C. Hinderling, “Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks,” Advanced Materials, vol. 20, no. 10, pp. 1962–1965, 2008, doi: 10.1002/adma.200702005.
KRISHNAMOORTHY, Sivashankar, Raphael PUGIN, Juergen BRUGGER, Harry HEINZELMANN und Christian HINDERLING, 2008. Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks. Advanced Materials. 2008. Bd. 20, Nr. 10, S. 1962–1965. DOI 10.1002/adma.200702005
Krishnamoorthy, Sivashankar, Raphael Pugin, Juergen Brugger, Harry Heinzelmann, and Christian Hinderling. 2008. “Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks.” Advanced Materials 20 (10): 1962–65. https://doi.org/10.1002/adma.200702005.
Krishnamoorthy, Sivashankar, et al. “Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks.” Advanced Materials, vol. 20, no. 10, 2008, pp. 1962–65, https://doi.org/10.1002/adma.200702005.


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