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dc.contributor.authorKrishnamoorthy, Sivashankar-
dc.contributor.authorVan den Boogaart, Marc Antonius Friedrich-
dc.contributor.authorBrugger, Juergen-
dc.contributor.authorHibert, Cyrille-
dc.contributor.authorPugin, Raphael-
dc.contributor.authorHinderling, Christian-
dc.contributor.authorHeinzelmann, Harry-
dc.date.accessioned2018-12-07T13:21:27Z-
dc.date.available2018-12-07T13:21:27Z-
dc.date.issued2008-
dc.identifier.issn0935-9648de_CH
dc.identifier.issn1521-4095de_CH
dc.identifier.urihttps://digitalcollection.zhaw.ch/handle/11475/13664-
dc.description.abstractA novel and flexible top‐down/bottom‐up scheme to achieve (sub‐)micrometer scale patterning of nanostructures with complementary micro‐/nanoarchitectures is presented. Nanostencils (perforated free‐standing Si3N4 membranes) are employed to pattern silicon nanopillars derived from the use of self‐assembled copolymer micelles as dry etch masks.de_CH
dc.language.isoende_CH
dc.publisherWileyde_CH
dc.relation.ispartofAdvanced Materialsde_CH
dc.rightsLicence according to publishing contractde_CH
dc.subject.ddc620.11: Werkstoffede_CH
dc.titleCombining micelle self-assembly with nanostencil lithography to create periodic/aperiodic micro-/nanopatterns on surfacesde_CH
dc.typeBeitrag in wissenschaftlicher Zeitschriftde_CH
dcterms.typeTextde_CH
zhaw.departementLife Sciences und Facility Managementde_CH
zhaw.organisationalunitInstitut für Chemie und Biotechnologie (ICBT)de_CH
dc.identifier.doi10.1002/adma.200702478de_CH
zhaw.funding.euNode_CH
zhaw.issue18de_CH
zhaw.originated.zhawYesde_CH
zhaw.pages.end3538de_CH
zhaw.pages.start3533de_CH
zhaw.publication.statuspublishedVersionde_CH
zhaw.volume20de_CH
zhaw.publication.reviewPeer review (Publikation)de_CH
Appears in collections:Publikationen Life Sciences und Facility Management

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