Ultraviolet/ozone treatment to reduce metal-graphene contact resistance

Li, Wei; Liang, Yiran; Yu, Dangmin; Peng, Lianmao; Pernstich, Kurt; Shen, Tian; Hight Walker, A. R.; Cheng, Guangjun; Hacker, Christina A.; Richter, Curt A.; Li, Qiliang; Gundlach, David J.; Liang, Xuelei

doi:10.1063/1.4804643

Publication type:	Article in scientific journal
Type of review:	Peer review (publication)
Title:	Ultraviolet/ozone treatment to reduce metal-graphene contact resistance
Authors:	Li, Wei Liang, Yiran Yu, Dangmin Peng, Lianmao Pernstich, Kurt Shen, Tian Hight Walker, A. R. Cheng, Guangjun Hacker, Christina A. Richter, Curt A. Li, Qiliang Gundlach, David J. Liang, Xuelei
DOI:	10.1063/1.4804643
Published in:	Applied Physics Letters
Volume(Issue):	102
Issue:	18
Issue Date:	4-Dec-2012
Publisher / Ed. Institution:	American Institute of Physics
ISSN:	0003-6951 1077-3118
Language:	English
Subjects:	Physics - Materials Science; Physics - Mesoscopic Systems and Quantum Hall Effect
Subject (DDC):	530: Physics
Abstract:	We report reduced contact resistance of single-layer graphene devices by using ultraviolet ozone treatment to modify the metal/graphene contact interface. The devices were fabricated from mechanically transferred, chemical vapor deposition grown single layer graphene. Ultraviolet ozone treatment of graphene in the contact regions as defined by photolithography and prior to metal deposition was found to reduce interface contamination originating from incomplete removal of poly(methyl-methacrylate) and photoresist. Our control experiment shows that exposure times up to 10 min did not introduce significant disorder in the graphene as characterized by Raman spectroscopy. By using the described approach, contact resistance of less than 200 Ω μm was achieved for 25 min ultraviolet ozone treatment, while not significantly altering the electrical properties of the graphene channel region of devices.
URI:	https://digitalcollection.zhaw.ch/handle/11475/12344
Fulltext version:	Published version
License (according to publishing contract):	Licence according to publishing contract
Departement:	School of Engineering
Organisational Unit:	Institute of Computational Physics (ICP)
Appears in collections:	Publikationen School of Engineering

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Li, W., Liang, Y., Yu, D., Peng, L., Pernstich, K., Shen, T., Hight Walker, A. R., Cheng, G., Hacker, C. A., Richter, C. A., Li, Q., Gundlach, D. J., & Liang, X. (2012). Ultraviolet/ozone treatment to reduce metal-graphene contact resistance. Applied Physics Letters, 102(18). https://doi.org/10.1063/1.4804643

Li, W. et al. (2012) ‘Ultraviolet/ozone treatment to reduce metal-graphene contact resistance’, Applied Physics Letters, 102(18). Available at: https://doi.org/10.1063/1.4804643.

W. Li et al., “Ultraviolet/ozone treatment to reduce metal-graphene contact resistance,” Applied Physics Letters, vol. 102, no. 18, Dec. 2012, doi: 10.1063/1.4804643.

LI, Wei, Yiran LIANG, Dangmin YU, Lianmao PENG, Kurt PERNSTICH, Tian SHEN, A. R. HIGHT WALKER, Guangjun CHENG, Christina A. HACKER, Curt A. RICHTER, Qiliang LI, David J. GUNDLACH und Xuelei LIANG, 2012. Ultraviolet/ozone treatment to reduce metal-graphene contact resistance. Applied Physics Letters. 4 Dezember 2012. Bd. 102, Nr. 18. DOI 10.1063/1.4804643

Li, Wei, Yiran Liang, Dangmin Yu, Lianmao Peng, Kurt Pernstich, Tian Shen, A. R. Hight Walker, et al. 2012. “Ultraviolet/Ozone Treatment to Reduce Metal-Graphene Contact Resistance.” Applied Physics Letters 102 (18). https://doi.org/10.1063/1.4804643.

Li, Wei, et al. “Ultraviolet/Ozone Treatment to Reduce Metal-Graphene Contact Resistance.” Applied Physics Letters, vol. 102, no. 18, Dec. 2012, https://doi.org/10.1063/1.4804643.