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https://doi.org/10.21256/zhaw-4744Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Krishnamoorthy, Sivashankar | - |
| dc.contributor.author | Hinderling, Christian | - |
| dc.contributor.author | Heinzelmann, Harry | - |
| dc.date.accessioned | 2018-10-18T13:46:02Z | - |
| dc.date.available | 2018-10-18T13:46:02Z | - |
| dc.date.issued | 2006 | - |
| dc.identifier.issn | 1369-7021 | de_CH |
| dc.identifier.issn | 1873-4103 | de_CH |
| dc.identifier.uri | https://digitalcollection.zhaw.ch/handle/11475/11958 | - |
| dc.description.abstract | The self-assembly processes of block copolymers offer interesting strategies to create patterns on nanometer length scales. The polymeric constituents, substrate surface properties, and experimental conditions all offer parameters that allow the control and optimization of pattern formation for specific applications. We review how such patterns can be obtained and discuss some potential applications using these patterns as (polymeric) nanostructures or templates, e.g. for nanoparticle assembly. The method offers interesting possibilities in combination with existing high-resolution lithography methods, and could become of particular interest in microtechnology and biosensing. | de_CH |
| dc.language.iso | en | de_CH |
| dc.publisher | Elsevier | de_CH |
| dc.relation.ispartof | Materials Today | de_CH |
| dc.rights | http://creativecommons.org/licenses/by-nc-nd/3.0/ | de_CH |
| dc.subject | Self-assembly | de_CH |
| dc.subject | Block-copolymers | de_CH |
| dc.subject | Nantoechnology | de_CH |
| dc.subject | Review | de_CH |
| dc.subject.ddc | 620: Ingenieurwesen | de_CH |
| dc.title | Nanoscale patterning with block copolymers | de_CH |
| dc.type | Beitrag in wissenschaftlicher Zeitschrift | de_CH |
| dcterms.type | Text | de_CH |
| zhaw.departement | Life Sciences und Facility Management | de_CH |
| zhaw.organisationalunit | Institut für Chemie und Biotechnologie (ICBT) | de_CH |
| dc.identifier.doi | 10.21256/zhaw-4744 | - |
| dc.identifier.doi | 10.1016/S1369-7021(06)71621-2 | de_CH |
| zhaw.funding.eu | No | de_CH |
| zhaw.issue | 9 | de_CH |
| zhaw.originated.zhaw | Yes | de_CH |
| zhaw.pages.end | 47 | de_CH |
| zhaw.pages.start | 40 | de_CH |
| zhaw.publication.status | publishedVersion | de_CH |
| zhaw.volume | 9 | de_CH |
| zhaw.publication.review | Peer review (Publikation) | de_CH |
| Appears in collections: | Publikationen Life Sciences und Facility Management | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 2006_Krishnamoorthy-Hinderling_Heinzelmann_Nanoscale_patterning.pdf | 2.37 MB | Adobe PDF |  View/Open |
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Krishnamoorthy, S., Hinderling, C., & Heinzelmann, H. (2006). Nanoscale patterning with block copolymers. Materials Today, 9(9), 40–47. https://doi.org/10.21256/zhaw-4744
Krishnamoorthy, S., Hinderling, C. and Heinzelmann, H. (2006) ‘Nanoscale patterning with block copolymers’, Materials Today, 9(9), pp. 40–47. Available at: https://doi.org/10.21256/zhaw-4744.
S. Krishnamoorthy, C. Hinderling, and H. Heinzelmann, “Nanoscale patterning with block copolymers,” Materials Today, vol. 9, no. 9, pp. 40–47, 2006, doi: 10.21256/zhaw-4744.
KRISHNAMOORTHY, Sivashankar, Christian HINDERLING und Harry HEINZELMANN, 2006. Nanoscale patterning with block copolymers. Materials Today. 2006. Bd. 9, Nr. 9, S. 40–47. DOI 10.21256/zhaw-4744
Krishnamoorthy, Sivashankar, Christian Hinderling, and Harry Heinzelmann. 2006. “Nanoscale Patterning with Block Copolymers.” Materials Today 9 (9): 40–47. https://doi.org/10.21256/zhaw-4744.
Krishnamoorthy, Sivashankar, et al. “Nanoscale Patterning with Block Copolymers.” Materials Today, vol. 9, no. 9, 2006, pp. 40–47, https://doi.org/10.21256/zhaw-4744.
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