Nanoscale patterning with block copolymers

Krishnamoorthy, Sivashankar; Hinderling, Christian; Heinzelmann, Harry

doi:10.21256/zhaw-4744

Please use this identifier to cite or link to this item: https://doi.org/10.21256/zhaw-4744

Publication type:	Article in scientific journal
Type of review:	Peer review (publication)
Title:	Nanoscale patterning with block copolymers
Authors:	Krishnamoorthy, Sivashankar Hinderling, Christian Heinzelmann, Harry
DOI:	10.21256/zhaw-4744 10.1016/S1369-7021(06)71621-2
Published in:	Materials Today
Volume(Issue):	9
Issue:	9
Page(s):	40
Pages to:	47
Issue Date:	2006
Publisher / Ed. Institution:	Elsevier
ISSN:	1369-7021 1873-4103
Language:	English
Subjects:	Self-assembly; Block-copolymers; Nantoechnology; Review
Subject (DDC):	620: Engineering
Abstract:	The self-assembly processes of block copolymers offer interesting strategies to create patterns on nanometer length scales. The polymeric constituents, substrate surface properties, and experimental conditions all offer parameters that allow the control and optimization of pattern formation for specific applications. We review how such patterns can be obtained and discuss some potential applications using these patterns as (polymeric) nanostructures or templates, e.g. for nanoparticle assembly. The method offers interesting possibilities in combination with existing high-resolution lithography methods, and could become of particular interest in microtechnology and biosensing.
URI:	https://digitalcollection.zhaw.ch/handle/11475/11958
Fulltext version:	Published version
License (according to publishing contract):	CC BY-NC-ND 3.0: Attribution - Non commercial - No derivatives 3.0 Unported
Departement:	Life Sciences and Facility Management
Organisational Unit:	Institute of Chemistry and Biotechnology (ICBT)
Appears in collections:	Publikationen Life Sciences und Facility Management

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Krishnamoorthy, S., Hinderling, C., & Heinzelmann, H. (2006). Nanoscale patterning with block copolymers. Materials Today, 9(9), 40–47. https://doi.org/10.21256/zhaw-4744

Krishnamoorthy, S., Hinderling, C. and Heinzelmann, H. (2006) ‘Nanoscale patterning with block copolymers’, Materials Today, 9(9), pp. 40–47. Available at: https://doi.org/10.21256/zhaw-4744.

S. Krishnamoorthy, C. Hinderling, and H. Heinzelmann, “Nanoscale patterning with block copolymers,” Materials Today, vol. 9, no. 9, pp. 40–47, 2006, doi: 10.21256/zhaw-4744.

KRISHNAMOORTHY, Sivashankar, Christian HINDERLING und Harry HEINZELMANN, 2006. Nanoscale patterning with block copolymers. Materials Today. 2006. Bd. 9, Nr. 9, S. 40–47. DOI 10.21256/zhaw-4744

Krishnamoorthy, Sivashankar, Christian Hinderling, and Harry Heinzelmann. 2006. “Nanoscale Patterning with Block Copolymers.” Materials Today 9 (9): 40–47. https://doi.org/10.21256/zhaw-4744.

Krishnamoorthy, Sivashankar, et al. “Nanoscale Patterning with Block Copolymers.” Materials Today, vol. 9, no. 9, 2006, pp. 40–47, https://doi.org/10.21256/zhaw-4744.