Please use this identifier to cite or link to this item: https://doi.org/10.21256/zhaw-4744
Publication type: Article in scientific journal
Type of review: Peer review (publication)
Title: Nanoscale patterning with block copolymers
Authors : Krishnamoorthy, Sivashankar
Hinderling, Christian
Heinzelmann, Harry
DOI : 10.21256/zhaw-4744
10.1016/S1369-7021(06)71621-2
Published in : Materials Today
Volume(Issue) : 9
Issue : 9
Pages : 40
Pages to: 47
Issue Date: 2006
Publisher / Ed. Institution : Elsevier
ISSN: 1369-7021
1873-4103
Language : English
Subjects : Self-assembly; Block-copolymers; Nantoechnology; Review
Subject (DDC) : 620: Engineering
Abstract: The self-assembly processes of block copolymers offer interesting strategies to create patterns on nanometer length scales. The polymeric constituents, substrate surface properties, and experimental conditions all offer parameters that allow the control and optimization of pattern formation for specific applications. We review how such patterns can be obtained and discuss some potential applications using these patterns as (polymeric) nanostructures or templates, e.g. for nanoparticle assembly. The method offers interesting possibilities in combination with existing high-resolution lithography methods, and could become of particular interest in microtechnology and biosensing.
URI: https://digitalcollection.zhaw.ch/handle/11475/11958
Fulltext version : Published version
License (according to publishing contract) : CC BY-NC-ND 3.0: Attribution - Non commercial - No derivatives 3.0 Unported
Departement: Life Sciences and Facility Management
Organisational Unit: Institute of Chemistry and Biotechnology (ICBT)
Appears in Collections:Publikationen Life Sciences und Facility Management

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