Please use this identifier to cite or link to this item: https://doi.org/10.21256/zhaw-4744
Title: Nanoscale patterning with block copolymers
Authors : Krishnamoorthy, Sivashankar
Hinderling, Christian
Heinzelmann, Harry
Published in : Materials today
Volume(Issue) : 9
Issue : 9
Pages : 40
Pages to: 47
Publisher / Ed. Institution : Elsevier
Issue Date: 2006
License (according to publishing contract) : CC BY-NC-ND 3.0: Attribution - Non commercial - No derivatives 3.0 Unported
Type of review: Peer review (publication)
Language : English
Subjects : Self-assembly; Block-copolymers; Nantoechnology; Review
Subject (DDC) : 620: Engineering
Abstract: The self-assembly processes of block copolymers offer interesting strategies to create patterns on nanometer length scales. The polymeric constituents, substrate surface properties, and experimental conditions all offer parameters that allow the control and optimization of pattern formation for specific applications. We review how such patterns can be obtained and discuss some potential applications using these patterns as (polymeric) nanostructures or templates, e.g. for nanoparticle assembly. The method offers interesting possibilities in combination with existing high-resolution lithography methods, and could become of particular interest in microtechnology and biosensing.
Departement: Life Sciences and Facility Management
Organisational Unit: Institute of Chemistry and Biotechnology (ICBT)
Publication type: Article in scientific journal
DOI : 10.21256/zhaw-4744
10.1016/S1369-7021(06)71621-2
ISSN: 1369-7021
1873-4103
URI: https://digitalcollection.zhaw.ch/handle/11475/11958
Appears in Collections:Publikationen Life Sciences und Facility Management

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