Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks

Krishnamoorthy, Sivashankar; Pugin, Raphael; Brugger, Juergen; Heinzelmann, Harry; Hinderling, Christian

doi:10.1002/adma.200702005

Publication type:	Article in scientific journal
Type of review:	Peer review (publication)
Title:	Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks
Authors:	Krishnamoorthy, Sivashankar Pugin, Raphael Brugger, Juergen Heinzelmann, Harry Hinderling, Christian
DOI:	10.1002/adma.200702005
Published in:	Advanced Materials
Volume(Issue):	20
Issue:	10
Page(s):	1962
Pages to:	1965
Issue Date:	2008
Publisher / Ed. Institution:	Wiley
ISSN:	0935-9648 1521-4095
Language:	English
Subjects:	Self-assembly; Surface structuring; Nanoparticles; Nanotechnology
Subject (DDC):	620: Engineering
Abstract:	Nanopatterned self-assembled monolayers (SAMs) are obtained from a simple, straight-forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diams. of approx. 60 nm on a continuous hydrophopic background or vice versa. The surfaces are shown to be excellent tools for the prepn. of arrays of nanocrystals
URI:	https://digitalcollection.zhaw.ch/handle/11475/11957
Fulltext version:	Published version
License (according to publishing contract):	Licence according to publishing contract
Departement:	Life Sciences and Facility Management
Organisational Unit:	Institute of Chemistry and Biotechnology (ICBT)
Appears in collections:	Publikationen Life Sciences und Facility Management

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Krishnamoorthy, S., Pugin, R., Brugger, J., Heinzelmann, H., & Hinderling, C. (2008). Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks. Advanced Materials, 20(10), 1962–1965. https://doi.org/10.1002/adma.200702005

Krishnamoorthy, S. et al. (2008) ‘Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks’, Advanced Materials, 20(10), pp. 1962–1965. Available at: https://doi.org/10.1002/adma.200702005.

S. Krishnamoorthy, R. Pugin, J. Brugger, H. Heinzelmann, and C. Hinderling, “Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks,” Advanced Materials, vol. 20, no. 10, pp. 1962–1965, 2008, doi: 10.1002/adma.200702005.

KRISHNAMOORTHY, Sivashankar, Raphael PUGIN, Juergen BRUGGER, Harry HEINZELMANN und Christian HINDERLING, 2008. Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks. Advanced Materials. 2008. Bd. 20, Nr. 10, S. 1962–1965. DOI 10.1002/adma.200702005

Krishnamoorthy, Sivashankar, Raphael Pugin, Juergen Brugger, Harry Heinzelmann, and Christian Hinderling. 2008. “Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks.” Advanced Materials 20 (10): 1962–65. https://doi.org/10.1002/adma.200702005.

Krishnamoorthy, Sivashankar, et al. “Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks.” Advanced Materials, vol. 20, no. 10, 2008, pp. 1962–65, https://doi.org/10.1002/adma.200702005.